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Application

4838289/05, 1990-06-11

(22)

Actual filing date

1990-06-11

(45)

Published

1994-01-15

(72)

Inventor

Andrjushenko L.A.Grinev B.V.Sotnikov V.T.Gershun A.S.Nikulina R.A.Kakhidze G.P.Juzhelevskij Ju.A.Lebedeva Z.S.

POLISHING COMPOSITION Russian patent published in 1994 - IPC

Abstract SU 1746698 A1

FIELD: final polishing of semiconductor substrates. SUBSTANCE: composition contains 40-50 % of low-molecular weight polyorganosiloxane rubber, 4-10 % of orthosilicic acid ester and 40-56 % of aluminum α-oxide. For the preparation of polishing composition all ingredients are mixed together. EFFECT: high quality of substrate surface to be treated. 3 tbl

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SU 1 746 698 A1

Authors

Andrjushenko L.A.

Grinev B.V.

Sotnikov V.T.

Gershun A.S.

Nikulina R.A.

Kakhidze G.P.

Juzhelevskij Ju.A.

Lebedeva Z.S.

Dates

1994-01-15—Published

1990-06-11—Filed

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