FIELD: final polishing of semiconductor substrates. SUBSTANCE: composition contains 40-50 % of low-molecular weight polyorganosiloxane rubber, 4-10 % of orthosilicic acid ester and 40-56 % of aluminum α-oxide. For the preparation of polishing composition all ingredients are mixed together. EFFECT: high quality of substrate surface to be treated. 3 tbl
| Title | Year | Author | Number |
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| MANUFACTURING TECHNIQUE FOR PARATERPHENYL MONOCRYSTAL BASE SCINTILLATION DETECTORS | 1990 |
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SU1715068A1 |
| CESIUM IODIDE-BASED SCINTILLATION MATERIAL AND METHOD OF PREPARATION THEREOF | 1997 |
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RU2138585C1 |
| SCINTILLATION UNIT | 0 |
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SU1102359A1 |
| SCINTILLATION DETECTOR | 1990 |
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SU1709830A1 |
| SCINTILLATION DETECTOR | 0 |
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SU1742756A1 |
| OPTICAL COMMUNICATION ELEMENT OF SCINTILLATION DETECTOR | 0 |
|
SU1614676A1 |
| IONIZING RADIATION DETECTOR | 2022 |
|
RU2795377C1 |
| ELEMENT OF OPTIC COMMUNICATION OF SCINTILLATION DETECTOR | 0 |
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|
SU1477106A1 |
Authors
Dates
1994-01-15—Published
1990-06-11—Filed