FIELD: polymeric coating. SUBSTANCE: polymeric coating on silicon-base is produced by di-p-xylylene pyrolysis. Volatile impurities content is 0.5%, rupture strength is 650 kg/cm2, water-absorption is 0.02%, specific volume resistance is 7•1015 Om•cm. Method involves the elimination of impurities from the parental product by di-p-xylylene and volatile impurities elimination under vacuum at 100-120 C followed by passing sublimated substance through the sublimation unit heated to 80-87 C, precipitation of di-p-xylylene on it and simultaneous pumping out nonprecipitated volatile impurities. Product can be used in electronic, radiotechnic and chemical industry. EFFECT: improved properties of product. 2 dwg, 2 tbl
Title | Year | Author | Number |
---|---|---|---|
METHOD OF PRESERVING POROUS MATERIALS | 1993 |
|
RU2080192C1 |
METHOD OF OBTAINING POLY-N-XYLYLENE COATINGS AND FILMS | 0 |
|
SU1151546A1 |
METHOD FOR MANUFACTURE OF POLY-P-XYLYLENE COATING | 1992 |
|
RU2017548C1 |
DEVICE FOR TREATING FLUOROAMMONIUM SILICON-CONTAINING PRODUCTS | 2003 |
|
RU2233694C1 |
APPARATUS FOR BATCH SUPPLY OF VAPORS OF SOLIDS AND LIQUIDS | 1992 |
|
RU2019247C1 |
METHOD OF POLY-P-XYLYLENE COATING PREPARING | 1985 |
|
RU1361800C |
METHOD FOR DESUBLIMATION OF SOLID SUBSTANCES AND DEVICE FOR ITS IMPLEMENTATION | 2017 |
|
RU2648320C1 |
METHOD OF MODIFYING POLYMER POROUS MATERIAL AND COMPOSITE MATERIAL OBTAINED USING SAID METHOD | 2014 |
|
RU2567886C2 |
METHOD FOR MANUFACTURE OF METAL CLUSTERS-CONTAINING FILM MATERIALS | 1992 |
|
RU2017547C1 |
ELECTROGRAPHIC DEVELOPER BACKING | 0 |
|
SU598579A3 |
Authors
Dates
1996-04-27—Published
1989-02-20—Filed