ETCHING SOLUTION Russian patent published in 2008 - IPC C03C15/00 

FIELD: special solutions.

SUBSTANCE: invention relates to etching solution used for treatment of glass surface and applying marker signs, pictures and others on it. Proposed etching solution contains the following components, wt.-%: hydrofluoric acid, 50.0-60.0; nitric acid, 15.0-20.0; polyacrylamide, 0.5-1.0; sulfuric acid, 10.0-15.0; selenic acid, 0.5-1.0, and water, the balance. Invention provides decreasing time for treatment of glass surface and enhancing output of labor. The glass rate value is 1.5-2 mcm/min. Invention provides enhancing the rate of glass treatment with the proposed etching solution.

EFFECT: improved and valuable properties of etching solution.

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