ETCHING SOLUTION FOR GLASS TREATMENT Russian patent published in 2017 - IPC C03C15/00 

Abstract RU 2611772 C1

FIELD: chemistry.

SUBSTANCE: etching solution for glass treatment, comprising hydrofluoric acid, nitric acid, polyacrylamide and water, additionally contains hydrochloric acid and glycerol in the following ratio, mass %: hydrofluoric acid 50.0-60.0; nitric acid 20.0-30.0; polyacrylamide 2.0-3.0; hydrochloric acid 9.0-11.0; glycerin 1.0-2.0; water 5.0-7.0.

EFFECT: increased etching process rate.

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Authors

Dates

2017-03-01Published

2016-02-29Filed