FIELD: machining of metals. SUBSTANCE: complex-alloyed facing is applied on articles by ion-plasma method in reactive medium. In this case consumable material used in process is produced from alloy of elements of IV-VI groups of periodic chart. At least one of them has higher coefficient of ion sputtering. Negative potential changing from value corresponding to threshold of selective ion sputtering in complex of components of consumable material with minimal coefficient of ion sputtering is fed in process of application of facing of article. EFFECT: improved efficiency of application of wear-resistant facings. 6 cl, 1 tbl
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