FIELD: electronic industry. SUBSTANCE: method involves the steps of: irradiating a polymeric film on substrate by vacuum ultraviolet light in styrol vapors through a photomask, irradiating it by light at wave-length of 20-250 nm in vacuum without photomask, keeping the polymeric film on substrate in saturated iodine vapors at a temperature from 20 degrees C up to temperature not exceeding a glass transition temperature of polymeric film, keeping the polymeric film in gaseous ozone medium and finally developing latent positive image by etching in oxygen plasma. EFFECT: enhanced efficiency.
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