FIELD: physics.
SUBSTANCE: according to the method, a light-sensitive layer of positive photoresist is deposited on a cleaned glass surface. 5-10 mcm windows are formed in said layer via photolithography. The surface is dried and a second layer of a metal-containing polymer is deposited, said polymer having the following ratio of components (%) polymethyl methacrylate 5.0; chloroform 93.4; Cu(CF3COO)2 1.6. Thermal annealing is carried out in an electric furnace for 3 hours at T=600°C and combustion products are removed.
EFFECT: easy manufacture and high wear-resistance.
1 tbl, 3 dwg
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