FIELD: protection of stocks. SUBSTANCE: method concludes in forming of image hologram of mark original and relief-phase reflecting hologram of the mark is fixed by deforming working surface of the mark. Multilayer dielectric structure is applied onto flexible substrate before the hologram is formed. The structure consists of intermediate, protection and working layers. Working layer is made of photosensitive thermoplastic material. Mark hologram is formed onto surface of working layer. Relief-phase hologram is fixed after the hologram is formed directly. After the hologram is fixed, the reflecting coating and cementing covering are applied in sequence; reflecting covering has controlled reflectivity. Masking coating may be applied between these two coatings. EFFECT: improved protection of stocks. 3 cl, 6 dwg
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Authors
Dates
1995-05-20—Published
1992-09-15—Filed