METHOD OF COPPER OXYCHLORIDE PRODUCING Russian patent published in 1995 - IPC

FIELD: chemical technology. SUBSTANCE: the source of parental acidic etching solution is the spent solution of printed assembling array production of the following composition, g/l: copper salt (CuCl₂,CuCl) 120-200 (as copper); hydrochloric acid (HCl) 30-150, and water ((H₂O)) the rest where 30% hydrogen peroxide ((H₂O₂)) solution is added before mixing at the ratio 30-60 ml per 1 l spent solution. The source of parental alkaline ammoniacal solution of complex copper salt is the spent alkaline etching solution of printed assembling array production containing complex copper salt [Cu(NH₃)₄Cl, [Cu (NH₃)₂]Cl at concentration 30-150 g/l (as copper) which preliminary is heated up to 40-90 C before mixing. At mixing prepared acidic solution is added to alkaline one up to pH value 3.5-6.0 in mixture. After ceasing gaseous substances liberation formed suspension is kept at 40-90 C up to attainment of copper concentration in effluent 1-2 g/l. Proposed method ensures to obtain copper oxychloride with copper content 53-56% and prevent copper ions entry and its complex chelate compounds to environment. Method is used in printed assembling array production. EFFECT: increased copper content, minimal copper content in sewage. 1 tbl