FIELD: electrochemistry. SUBSTANCE: polishing etchant contains, g/l: heptanickelsulfate 200-400; hydrofluoric acid 28.7-63.2. EFFECT: increased efficiency. 1 tbl
Title | Year | Author | Number |
---|---|---|---|
COMPOSITION FOR NICKEL ELECTROPLATING | 1991 |
|
RU2009571C1 |
CHROMIZING ELECTROLYTE | 1994 |
|
RU2088699C1 |
METHOD FOR ELECTROLYTIC CHROMIUM PLATING | 2020 |
|
RU2762695C1 |
POLISHING PICKLING SOLUTION FOR INDIUM ANTIMONIDE | 0 |
|
SU1059033A1 |
METHOD OF MANUFACTURING SEMICONDUCTOR PHOTOCONVERTERS | 0 |
|
SU1042541A1 |
METHOD FOR PROCESSING TITANIUM AND ITS ALLOYS IN ORDER TO INCREASE ITS CORROSION RESISTANCE AND ELECTROLYTE FOR MICRO-ARC OXIDATION OF TITANIUM AND ITS ALLOYS IN ORDER TO INCREASE CORROSION RESISTANCE | 2021 |
|
RU2756672C1 |
METHOD FOR PRODUCTION OF SILICON STRUCTURES | 1994 |
|
RU2086039C1 |
COMPOSITION FOR ETCHING SODIUM NITRIDE SINGLE CRYSTALS | 0 |
|
SU1612000A1 |
METHOD OF MAKING OF SILICATE FIBER FROM NATURAL CHRYSOTILE ASBESTOS | 1989 |
|
RU2010777C1 |
COMPOSITION FOR ELECTROCHEMICALLY APPLYING CHROME COATINGS ONTO SILICON CONTAINING MATERIALS | 1993 |
|
RU2062525C1 |
Authors
Dates
1996-03-27—Published
1992-12-07—Filed