GAS-PLASMA MIXTURE DISPLACEMENT METHOD Russian patent published in 1996 - IPC

Abstract RU 2066516 C1

FIELD: gas-plasma mixture displacement in straight and curvilinear channels, centrifuges, etc. SUBSTANCE: only thin layer of gas mixture is transformed to plasma and displaced that contacts surface and carries away gas mixture due to friction. Plasma state of moving layer is maintained by eddy currents built up as plasma layer is repulsed from contacting surface by magnetic cushion. Difference in motion speed of plasma layer and gas mixture is not over critical speed of gas used. EFFECT: enlarged functional capabilities.

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RU 2 066 516 C1

Authors

Irdyncheev L.A.

Astakhov V.I.

Kirpichenko V.Ja.

Kolomejtsev L.F.

Dates

1996-09-10Published

1994-01-05Filed