DEVICE FOR DEPOSITION OF THIN FILMS IN VACUUM Russian patent published in 1996 - IPC

FIELD: microelectronics. SUBSTANCE: device for deposition of thin films in vacuum has vacuum chamber with substrate holder, evaporator incorporating cathode, anode and igniting electrode, water-cooled drop catcher installed between cathode and substrate holder. Water-cooled drop catcher has height equal to diameter of cathode and is placed equidistantly from cathode and substrate holder. EFFECT: simplified design, manufacture of homogeneous condensates without drop phase with high speed of their deposition. 2 cl, 2 dwg