FIELD: plasma devices. SUBSTANCE: method involves evaporation of fullers and/or their compounds, their ionization and extraction of ions for beam generation. Evaporation is done from inner effusion chamber which is located in outer effusion chamber. Ionization is run under contact of fuller vapors and inner surface of external effusion chamber which is made from material which decreases electron work function. EFFECT: increased functional capabilities. 3 cl, 1 dwg
