METHOD FOR MANUFACTURING INTRAOSSEOUS IMPLANTS Russian patent published in 1997 - IPC

Abstract RU 2074674 C1

FIELD: orthopedic stomatology. SUBSTANCE: onto titanium-made implant base four coatings are applied by plasma sputtering, namely: two layers of titanium or titanium hydride of different dispersities and thicknesses, third layer made of mechanical mixture of titanium or titanium hydride or hydroxylapatite with weight ratio of, respectively, 60-80 wt.% and 20-40 wt. %, and outer layer of hydroxylapatite. To increase mechanical strength of implant, stuttering is carried out layer-wise at different sputtering modes to provide gradual transition from compact titanium structure to that of bioactive layer. EFFECT: improved strength of implants. 1 dwg, 1 tbl

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RU 2 074 674 C1

Authors

Ljasnikov V.N.

Kalganova S.G.

Vereshchagina L.A.

Dates

1997-03-10Published

1994-08-09Filed