FIELD: devices for application of vacuum plasma coatings. SUBSTANCE: vacuum is given rise in vacuum chamber, and inert gas is supplied. Positive potential is applied to anode and negative potential is applied to screen and cathode-treated part from power source. Developed between screen and cathode-treated part is effect of hollow cathode manifesting itself in considerable rise of current density, increased grade of plasma ionization and reduced charge glowing. Coating evaporated from crucible is condensed on cathode-treated part. EFFECT: higher efficiency. 1 dwg
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