METHOD OF FILTRATION OF DROP PHASE DURING DEPOSITION FROM VACUUM-ARC DISCHARGE PLASMA Russian patent published in 2018 - IPC C23C14/24 H01J3/40 

FIELD: technological processes.

SUBSTANCE: invention relates to the field of deposition of coatings from a vacuum-arc discharge plasma and can be used to produce a filtered plasma. Method for filtering a drop phase from a vacuum-arc discharge plasma when depositing a Ti-Al multi-layer coating on the surface of a part is characterized in that a process grid with square cells with an optical transparency of 65 % made of stainless steel rod is placed in front of the workpiece at a distance of 7 mm from it, this process grid is electrically connected to the said part, and a negative potential is applied to the said grid.

EFFECT: improved quality and improved adhesion, reduced porosity, improved physical and mechanical properties, namely microhardness and roughness of the applied coating, is provided due to the decrease in the drop phase and increase in the density of the plasma flow at the outlet of the filter.

1 cl, 2 dwg, 1 ex