METHOD AND APPARATUS FOR CONTINUOUSLY ETCHING COPPER Russian patent published in 1997 - IPC

FIELD: metal etching. SUBSTANCE: invention relates to environmentally acceptable production of high-quality articles, e.g. circuit plates. After stock has been treated with etching solution, it is restored by electrochemical regeneration: removal of etching products of the type of cuprous chloride through their reduction into initial metal state and oxidation into cupric form is conducted independently along with removing cupric ions excess or reducing cupric ions into monovalent state on electrolyzer cathode and release of oxygen on anode. Apparatus consists of etching machine and two etching solution regeneration units - primary and secondary. Primary unit has total copper content sensor, electrolyzer with electrolytic bath separated by semipermeable membrane into two compartments (cathode and anode ones), power source, and pump with etching solution supply strokes. Secondary unit contains cuprous ion sensor, second power source, electrolyzer with common electrolytic bath hydraulically connected to etching machine with its hollow through membrane-type cathode compartment of electrolyzer. Sensors are linked to etching machine, pump, and power sources. EFFECT: improved quality of etched produce. 5 cl, 1 dwg