FIELD: chemical technology. SUBSTANCE: method involves the following stages: treatment of etching agent containing copper (I) chloride or copper-containing iron chloride by electrolysis using diaphragm for removing copper precipitated in cathode chamber; feeding gaseous chlorine formed in anode chamber to another etching agent that has been used in etching process. This procedure makes the latter to be used to regeneration. EFFECT: improved method of treatment, effectiveness, safety, decreased cost and consumption. 2 cl, 2 dwg
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Authors
Dates
1998-10-10—Published
1992-10-27—Filed