FIELD: treatment of surfaces. SUBSTANCE: the device for surface treatment uses a chamber-reactor with nozzles-dispersers for uniform distribution of electrolyte supplied to it evaporator for partial or complete evaporation of electrolyte, and an anode with through holes used to feed the obtained conducting medium onto the surface under treatment; for a system for fixing the anode and object under treatment relative to each other. The method provides for formation in the presurface area of a layer of plasma stable in time with reducing properties by feeding the conducting medium onto the surface under treatment through the anode with through holes. EFFECT: facilitated procedure. 10 cl, 3 dwg
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Authors
Dates
1997-12-20—Published
1997-01-24—Filed