COMPLEX ION-PLASMA PROCESSING UNIT Russian patent published in 2012 - IPC C23C14/30 

FIELD: machine building.

SUBSTANCE: proposed unit comprises vacuum chamber, electric arc plasma source made up of, at least, long electrode arranged in said chamber, article holder with insulated current feed, electron emitter made up of emission chamber accommodating long liner cathode of electron emitter communicated with vacuum chamber via perforated baffle with its holes arranged along lengthwise axis of said linear cathode. Vacuum-arc discharge power supply allow connecting negative pole to said linear cathode or electrode positive pole to emission or vacuum chamber. Electron emitter power supply allows connecting negative pole to emission chamber positive pole to article holder or electrode.

EFFECT: uniform heating of long articles.

2 cl, 2 dwg