IMPLANTATION SET Russian patent published in 1998 - IPC

Abstract RU 2110110 C1

FIELD: radiation study of materials. SUBSTANCE: invention refers to improvement of electrophysical, chemical and mechanical properties of surfaces of articles manufactured from various materials. Implantation set is characterized by use of source of fast heavy atoms based on magnetic trap with revolving plasma, transportation system of fluxes of fast heavy atoms of fan type that presents outlet funnel with azimuthal dimension of 360 deg, system positioning irradiated samples in area of outgoing flux. EFFECT: increased productivity and improved purity of generated implanted fluxes, increased area of implanted surface without usage of scanning devices and enhanced versatility of set. 2 dwg

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RU 2 110 110 C1

Authors

Volosov V.I.

Churkin I.N.

Dates

1998-04-27—Published

1996-07-29—Filed