METHOD OF PULSE-PERIODIC ION AND PLASMA TREATMENT OF PRODUCT AND DEVICE FOR ITS REALIZATION Russian patent published in 1998 - IPC

FIELD: engineering physics, applicable for changing the properties of surface layers of products by way of ion implantation or plasma precipitation of coats in conditions of pulse-periodic ion implantation. SUBSTANCE: the method provides for alternate treatment of products by arc-discharge plasma and pulses of ions accelerated from this plasma. Plasma generation is carried out continuously. Correlation of doses of irradiation by accelerated ions and plasma is controlled due to variation of repetition frequency, duration of pulses of accelerating voltage, variation of distance between ions and plasma source and product. The device for realization of the method has a vacuum-arc evaporator in the form of coaxial external anode and internal cathode furnished with an ignition unit, and a pulse system of acceleration of ions from evaporator plasma. The vacuum-arc evaporator has a permanent arc supply source and is furnished with a means for stabilization of burning of continuous arc and a device for plasma cleaning of microdrop fraction. For stabilization of burning of continuous arc magnetic with an external screen of magnetic material are positioned on the anode; the arc supply source is connected via the coil windings to the anode, and the magnetic screen is electrically coupled to the anode. The device for plasma cleaning of microdrop fraction is positioned near the open end of the anode and made in the form of a coaxial system of gate electrodes made in the form of coaxial truncated hollow cones. The shape of each electrode is close to the shape of magnetic field lines in the point of location of electrodes. The gate system is connected to the positive terminal of the additional voltage source, whose second terminal is connected to the anode. EFFECT: facilitated procedure. 4 cl, 1 dwg