METHOD AND APPARATUS FOR LOW-CONCENTRATION TOXIC VAPORIZED IMPURITIES FROM INDUSTRIAL GASES Russian patent published in 1998 - IPC

Abstract RU 2112589 C1

FIELD: gas treatment. SUBSTANCE: industrial gases with partial pressure below saturation pressure are pumped through ionizators action zone to form charged particles in gas. Pumping velocity and gas ionization intensity are regulated such as to provide total number of ions created in the ionization zone expressed as 1 ion per 2-6 molecules of impurities. Aerosol formed by condensed impurities is then removed from gas in a zone where particle size and mass of the aerosol are at their maximum. Apparatus contains generator to form particles in the gas under treatment, gas- pumping system, ionization chamber, as well as coagulation chamber and a system for continuously removing aerosol from gas connected in series with ionization chamber. EFFECT: reduced power consumption. 2 cl, 1 dwg

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RU 2 112 589 C1

Authors

Bugaev S.P.

Kozyrev A.V.

Sochugov N.S.

Dates

1998-06-10Published

1996-12-24Filed