DEVICE FOR GENERATION OF LOW-TEMPERATURE GAS- DISCHARGE PLASMA Russian patent published in 1998 - IPC

FIELD: plasma generation equipment, in particular, for final cleaning and activation of articles before application of coating, ion plating in course of coating application, ion nitride hardening. SUBSTANCE: vacuum chamber is used as large-size hollow anode. Cathode is designed as combined cathode which consists of hot cathode and hollow cylindrical cathode which embraces hot cathode and is connected to its end. Ratio of hollow cathode diameter D and its length L conforms to condition L = (304) D. Size of hollow cathode piece which extends outside anode chamber is equal to D. EFFECT: increased efficiency of plasma generation. 1 dwg