MAGNETRON SPRAYING SYSTEM Russian patent published in 2004 - IPC

FIELD: plasma engineering.

SUBSTANCE: proposed magnetron system designed for vacuum ion-plasma coating of solid bodies with thin films of metals and their compounds has chamber, anode, target-cathode, and magnetic unit incorporating magnetic circuit and permanent magnets. Target-cathode and magnetic unit are elongated; target-cathode accommodates magnetic unit incorporating magnetic circuit that mounts three parallel lines of permanent magnets of different residual magnetic field flux density; side lines of magnets are closed on ends through extreme magnets and their polarity is reverse to that of central line of magnets; residual flux density of permanent-magnet field near ends of magnetic unit is higher by 5 - 15% than that in central part. As an alternative, chamber walls may function as anode, target-cathode may be made in the form of revolving cylinder, and magnetic unit may be fixed in position inside this cylinder.

EFFECT: enlarged area of uniform spraying of coating without enlarging size of magnetron spraying system.

3 cl, 2 dwg, 1 tbl