PROCESS OF LASER APPLICATION OF FILM Russian patent published in 1998 - IPC

Abstract RU 2117071 C1

FIELD: precision instrument making, microelectronics, manufacture of optical and electronic elements, application of decorative patterns. SUBSTANCE: process includes transfer of material of donor film applied on substrate transparent to laser radiation to second substrate by heating of donor film with laser radiation through substrate, evaporation of material of second substrate from its surface by beam passed through donor film. Thickness of donor film is chosen in agreement with specified mass relation of materials of donor film and second substrate in mix of deposited film. EFFECT: expanded class of materials used in film application. 4 cl, 1 dwg

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RU 2 117 071 C1

Authors

Vejko V.P.

Shakhno E.A.

Dates

1998-08-10Published

1997-04-25Filed