DEVICE FOR MONITORING AND CONTROLLING COMPLEX OF PULSED LASER DEPOSITION Russian patent published in 2020 - IPC C23C14/54 C23C14/34 G06F17/00 

FIELD: physics.

SUBSTANCE: invention relates to a device for monitoring and controlling a pulsed laser deposition (PLD) complex. Device comprises pulsed laser control unit, laser parameters monitoring unit, temperature control unit, a substrate temperature control unit, a pressure control unit in the deposition chamber, a pressure control unit in the deposition chamber, a substrate and target distance monitoring unit, unit for controlling distance between substrate and target with appropriate connections between each other and with PLD complex and the PLD process preliminary simulation unit by the Monte-Carlo kinetic method with the movement and collision description with the surface of each individual atom from the deposited substance flow with reference to the specific task, with the possibility of simulation of such PLD process stages as radiation absorption by target material, formation and expansion of gas-plasma cloud of ablation products, interaction of laser ablation products with substrate surface, formation and growth of coating film, with possibility of adjusting characteristics and properties of coating.

EFFECT: technical result consists in expansion of functional capabilities with provision of maximum characteristics and properties of obtained coatings, such as: increased wear resistance of surfaces, increased coating continuity; obtaining a homogeneous coating on the entire surface and thereby creating conditions for laminar fluid motion over the obtained coating of the surface of the article to be protected.

1 cl, 12 dwg