PROCESS OF FORMATION OF VOLUMETRIC-POROUS LAYER OF METAL WITH OPEN POROSITY ON CURRENT-CONDUCTING BACKING Russian patent published in 2000 - IPC

FIELD: electrical engineering, chemical and electrochemical technology of manufacture of elements with volumetric-porous layers of metal. SUBSTANCE: process consist in formation of surface layer of initial composition by way of porous oxidation of material of surface layer of backing, in reduction of produced layer of porous oxide to metal at temperature below that of sintering of pores in porous layer. In specific case, porous oxidation is conducted electrochemically in electrolyte, plasma- electrochemically in solution of electrolyte or chemically in electrolyte. Produced surface layer of porous oxide is reduced to metal chemically in solution containing reducing agent, chemically in gas atmosphere carrying gas-reducing agent, electrochemically by cathode reduction in solution of electrolyte or electrochemically by cathode reduction in melt of electrolyte. Sheet or foil of compact metal, bimetal element made of compact metal, element made of porous metal or element made of compact metal with surface layer of porous metal is used in the capacity of backing. EFFECT: expanded range of used materials, provision for reiteration, simplified realization. 14 cl, 4 dwg