FIELD: optical and optoelectronic instruments. SUBSTANCE: method consists in step-by- step irradiation of the area of supposed location of optical and optoelectronic instruments, reception of the reflected beam, normalization of a signal proportional to the difference of intensities of reflected radiation in the "n"-th and "(n-1)"-th steps of scanning, and a signal proportional to the difference of intensities of reflected radiation in the "(n+1)"-th and "n"-th steps of scanning, the presence of optical and optoelectronic instruments is judged by the presence of these signals, then the object is irradiated by plane-polarized radiation, reflected radiation is divided into two beams with orthogonal polarizations, their separated display is accomplished, a signal is normalized proportional to the relation between the intensity of the reflected beam, having a plane of polarization orthogonal to the plane of polarization of the irradiating radiation, and the intensity of the beam, having a plane of polarization coinciding with the plane of polarization of the irradiating radiation, the presence of corner and cat's eye reflectors is judged by the presence of the latter radiation, then the object is alternately radiated by two aligned beams with different wavelengths, alternative display of the intensities of the reflected radiation at these wavelengths is accomplished, a signal is formalized proportional to the relation between the intensities of radiations at these wavelengths and their sum, the presence of cat's eye reflectors is judged by the presence of the latter radiation. EFFECT: selection of instruments against the background of diffusion-reflecting objects, corner and cat's eye reflectors. 1 dwg
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Authors
Dates
2000-08-27—Published
1999-06-15—Filed