FIELD: lithography; methods of production of plate base for lithography. SUBSTANCE: method includes contacting of base, for instance, aluminum or plastic with liquid with pH 9 or above, and containing silicate solution, for instance, sodium silicate in which material is dispersed in the form of macroparticles, for instance, aluminum or titanium oxide. In hardening, said liquid forms hydrophilic layer on the base. Invention also covers description of base as such. EFFECT: higher efficiency. 37 cl
