THERMOSENSITIVE COMPOSITION AND METHOD OF USING THERMOSENSITIVE COMPOSITION FOR MANUFACTURE OF LITHOGRAPHIC PRINTING FORM Russian patent published in 2000 - IPC

Abstract RU 2153986 C2

FIELD: polygraphy. SUBSTANCE: coat on lithographic substrate contains complex of phenolic resin insoluble in developer and composition forming thermosensitive complex with phenolic resin. The complex is less soluble in developer solution than phenolic resin unbound with complex. Upon heating at intensity corresponding to related pattern, complex is decomposed to release phenolic resin, which is soluble in developer solution. Difference between solubility of heated and unheated portions of phenolic resin is increased in case phenolic resin is bound with complex. Lithographic substrate preferably contains material absorbing laser radiation. There exists a lot of compositions forming thermosensitive complexes with phenolic resin, such as quinoline, benzothiazole, pyridine and imidazole compositions. Thermosensitive composition may be used for manufacture of matrices of positive working lithographic forms. EFFECT: improved quality of matrices manufactured from this composition. 41 cl, 1 tbl, 31 ex

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RU 2 153 986 C2

Authors

Parsons Gehret Rodri

Rajli Dejvid Stiven

Khor Richard Dejvid

Mank Ehlan Stenli Viktor

Dates

2000-08-10Published

1997-04-22Filed