METHOD OF MANUFACTURING FULL FORM FROM PHOTOPOLYMERIZING MATERIALS Russian patent published in 2001 - IPC

Abstract RU 2161545 C2

FIELD: foundry. SUBSTANCE: method includes application to photopolymerizing pattern of hard shell from heatproof composition and heating of photopolymerizing pattern in hard shells in two stages. At the first stage in region of low temperature inside shell, reducing gas atmosphere is maintained at temperatures of 300-500 C. Pattern material softens in its entire volume. In so doing, no coke residue in surface layers and difficult-to-remove crust are formed. Pattern material partially flows out through gating system and partially penetrates into pores of shell. At the second stage, in the region of high temperature, oxidizing gas atmosphere is formed. It makes possible to activate the process of pattern material withdrawal due to burning of products of material decomposition. EFFECT: higher quality of molds and castings. 2 cl, 1 tbl, 1 ex

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RU 2 161 545 C2

Authors

Vasil'Ev V.A.

Safonov A.N.

Dates

2001-01-10Published

1998-06-11Filed