FILTERING MASK FOR FACE Russian patent published in 2001 - IPC

FIELD: individual protective facilities. SUBSTANCE: mask has cotton base, members for retaining mask on head including flexible aluminum part conformable to nasal region, headband and hermetically sealing members adhering to temporal and mental regions, and flexible filtering layer containing activated carbon and retained on nasolabial region. Base is made from knitted fabric with total linear density of 70.0-72.0 tex and 2+2 ribbed weave. Portion of mask adhering to nasolabial region is made in 1+1 ribbed weave. Hermetically sealing portion of mask adhering to temporal region and horizontal hermetically sealing portion extending under mental region are made from high-tensile Spandex polyurethane thread reinforced with cotton yarn of 70.0-74.0 tex density. Vertical headband attached to hermetically sealing member adhering to temporal region is made from strip knitted in 1+1 ribbed weave of cotton yarn with linear density of 70.0-72.0 tex. Flexible aluminum part adhering to nasal region is positioned in blind knitted pocket. Removable tubular filtering layer is knitted in plain weave with density in horizontal plane within the range of 50-52 per 100 mm and in vertical plane within the range of 70-72 per 100 mm from thread similar to Dacron with total linear density of 80-84 tex, and is filled with activated carbon impregnated with Furacillin. Layer is wound into spiral, with coils being fixed one with respect to the other. Outer diameter of filtering layer is equal to outer diameter of its retainer fastened to mask base in nasolabial region. Mentioned retainer is made in the form of knitted double-layer ring of 2+2 ribbed weave from high-tensile Spandex polyurethane thread. Mask is used for protecting respiratory organs from hazardous chemical substances and gases in plant premises and laboratories, as well as under emergency situations. EFFECT: increased efficiency by improved attachment to face, increased service time and wider range of media in which mask may be used. 8 dwg