METHOD OF GAS CLEANING AND DEVICE FOR ITS EMBODIMENT Russian patent published in 2001 - IPC

FIELD: gas cleaning. SUBSTANCE: method includes multiple interaction of liquid phase under action of swirl effect with tangentially moving gas flow. In this case, interaction, first, is effected under foam conditions. Liquid phase is subjected to compression in gas- liquid disperser. Liquid phase leaving the disperser collides with cavitator-dissector and interacts with tangentially moving gas flow with subsequent multiple interaction of both flows under gas-liquid conditions in swirl chamber. Device for gas cleaning includes body, tangential branch pipe for introduction of gas to be cleaned, branch pipes for supply of liquid phase, auger located in body to form swirl-chamber, remote cavitation- swirl chamber at body inlet. Located in said chamber is gas-liquid disperser for provision of interaction of liquid phase with gas flow under foam conditions. EFFECT: higher separation efficiency of device. 4 cl, 1 dwg