FIELD: printing industry. SUBSTANCE: invention relates to multiplication unit capable of being used in photolithography at wavelengths 193 and 248 nm. Lens resistant to laser effects (pressing or compaction) is made either by flame hydrolysis technique or according to sol-gel method using organosilicon compounds. When irradiated by high-intensity dose of excimer emission (I2N = 6,3•1010), lens shows phase front distortion less than 0.095 ppm. EFFECT: improved photolithographic process reliability. 5 cl, 1 dwg
Authors
Dates
2001-11-10—Published
1997-08-27—Filed