METHOD FOR CONTROLLING HIGH-FREQUENCY PLASMA DISPLAY Russian patent published in 2003 - IPC

Abstract RU 2200984 C2

FIELD: controlling high-frequency plasma displays. SUBSTANCE: method involves initiation of high-frequency discharge in display characterized BY low loss and quasistationary behavior and determination of lower boundary of operating frequency region of maintaining voltage at predetermined distance between main electrodes of plasma display cell and preset density of operating current through cell. High-frequency discharge generation in cells enables use of mixtures with high content of xenon as working gas and also use of xenon for raising effectiveness of conversion of electrical energy imparted in discharge into ultraviolet radiation of discharge which enhances efficiency of plasma display. Proposed method also implies determination of lower boundary of operating frequencies for high-frequency maintaining voltage by using xenon as dominating gaseous component of working gas. Determination of lower boundary of operating frequencies enables setting operating frequency of high-frequency maintaining voltage in close proximity of mentioned boundary which in its turn makes it possible to reduce not only loss caused by discharge proper but also losses in electrodes thereby ensuring high efficiency and brightness of high-frequency display; in addition it enables implementing display at lower cost. EFFECT: enhanced efficiency of high-frequency plasma display. 14 cl, 2 dwg

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RU 2 200 984 C2

Authors

Bogatov N.A.

Brodskij Ju.Ja.

Golubev S.V.

Litvak A.G.

Dates

2003-03-20Published

2001-02-08Filed