FIELD: production of antireflecting coatings. SUBSTANCE: transparent or semitransparent part has at least one antireflecting layer whose thickness is chosen so as to ensure minimal reflectivity factor perceived by coated part which is found from formula given in description of invention. Device for depositing antireflecting film has reactor chamber, plasma generator, and optical measuring instrument; the latter has polarized radiation source for conveying light beam with chosen wavelength to substrate at chosen incidence angle, photodetector for measuring intensity of reflected part of light beam, and microprocessor coupled with photodetector, flow valve, delivery valve, and power supply and used to control them in compliance with intensity of light-beam reflected part. Thickness of deposited antireflecting coating is determined so as to ensure that finally perceived reflectivity factor FAR≤1/2F0, where F0 is reflectivity factor perceived before coating is applied. EFFECT: improved properties of antireflecting coatings obtained. 7 cl, 14 dwg, 1 tbl
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Authors
Dates
2003-05-10—Published
1997-12-12—Filed