FIELD: instrument engineering.
SUBSTANCE: invention relates to the field of optical instrument engineering and concerns a device for investigation of thickness and dielectric properties of thin films. Device includes two lasers with different wavelength, dividing cube, light flux expander, lens, two polarizers, device for violation of total internal reflection, mirror, focusing lens and photosensitive matrix. Device for violation of total internal reflection is made in the form of a semicylindrical lens with a reflecting element on its plane in the form of a thin metal film. Optical axes of polarizers make angle of 45° with flat surface of semicylindrical lens, at that polarizer second in direction of beam can perform both p-polarization and s-polarization. Elements of device are arranged on platform, perpendicular to flat surface of semicylindrical lens, wherein the platform has the possibility of rotating about the vertical axis of the semicylindrical lens, and the mirror has the possibility of rotating about an axis perpendicular to the platform.
EFFECT: possibility of simultaneous measurement of thickness and dielectric permeability of thin films during their manufacture.
1 cl, 1 dwg
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Authors
Dates
2019-07-09—Published
2018-06-20—Filed