ION SOURCE Russian patent published in 2003 - IPC

FIELD: generation of ion beams including multivalent, highly charged, and polarized ion beams. SUBSTANCE: proposed ion source has electron gun, drift structure, electron collector, electron deflecting unit, focusing magnetic system, and system for introducing working material into evacuated case. All these components are tubular structures. Electron gun has cathode incorporating electron emitter in the form of truncated cone and surrounding internal and external false cathodes of same shape. Electron deflecting unit has electron deflector in the form of truncated cone with one or more holes, inner and outer focusing electrodes of deflecting unit, as well as inner and outer anodes of deflecting unit. Drift structure has inner and outer coaxial tubular sections with identically shaped surfaces of revolution. Electron collector has inner and outer coaxial tubular electrodes with identically shaped surfaces of revolution. In addition ion source is provided with newly introduced one or more pairs of matching electrodes with identically shaped surfaces of revolution. EFFECT: enhanced intensity of ion beams produced by ion source. 5 cl, 1 dwg