ION SOURCE Russian patent published in 1996 - IPC

FIELD: production of ion beams, such as beams of multicharge and high-charge ions, including stripped nuclei. SUBSTANCE: ion source has electron gun incorporating cathode, anode, and focusing electrode, electron drift structure, focusing magnetic system, and working substance admission system; cathode is made of cathode proper and surrounding cathode disk with central bore; introduced past drift structure, opposite electron gun, is electron mirror that has mirror proper with central bore, focusing electrode, and anode. Electron collector with hole along axis is mounted past electron gun anode and in front of mirror anode. EFFECT: enlarged functional capabilities. 4 cl, 1 dwg