FIELD: ceramics. SUBSTANCE: thermal etching of ceramics is, in particular, performed to develop borders of its grains and examine grainy microstructure. Invention is applicable to industrial and nuclear ceramics, in particular to UO2 and mixtures (U,Pu)O2. Etching is accomplished in a stove with controlled atmosphere formed by oxidizing gas ensuring chemical potential of oxygen from - 75 kJ/mole to -125 kJ/mole. Process includes following consecutive steps: rapidly raising of temperature at velocity 900-1500 C/h from starting temperature to temperature plateau (1250-1450 C), maintaining temperature plateau during 15 to 30 min, and lowering temperature to its end value. EFFECT: improved quality of optical image of grainy structure and reduced cost. 20 cl, 17 dwg, 4 tbl, 11 ex
Authors
Dates
2003-07-10—Published
1998-10-20—Filed