PLASMA ELECTRON SOURCE Russian patent published in 2003 - IPC

FIELD: gaseous-discharge high- vacuum devices. SUBSTANCE: plasma source wherein pressure is maintained below 0.1 Pa has internal and external pole shoes in the form of bodies of revolution with central bore and with magnetomotive-force source placed in-between, as well as sealed housing accommodating hollow diaphragmatic arc cathode with gas feeder, main and intermediate anodes in the form of bodies of revolution with central bore coaxially installed between coaxial output bores of cathode and housing. Intermediate anode, internal pole shoe, annular header, main anode, and external pole shoe are installed in tandem between output bores of cathode and housing. Main anode is made of magnetically soft material and is disposed so that at least 30% of magnetic flux built up in space between pole shoes is passed through its bore. Internal and external pole shoes are electrically connected to cathode. Plasma source is generally provided with annular header communicating with additional gas feeder. Annular header has holes for passing gas to space between pole shoes. EFFECT: enhanced effectiveness of electron beam extraction; enhanced gas and energy efficiency. 8 cl, 2 dwg