PLASMA ELECTRON SOURCE Russian patent published in 2003 - IPC

FIELD: plasma, electron-beam and plasmachemical engineering; experimental physics. SUBSTANCE: electron source designed to produce continuous electron beam and may be found useful in developing electron-beam devices has hollow cathode, anode, accelerating electrode with central hole for shaping electron beam, and flange-mounted insulators; anode emitting hole is covered with metal fine- structure mesh. Heat-resistant inorganic insulating disk with central hole is placed between anode and accelerating electrode. Diameter of insulating disk hole is greater than that of anode emitting hole and smaller than diameter of accelerating electrode hole. EFFECT: enhanced operating pressure with accelerating gap strength maintained at same level. 1 cl, 1 dwg