FIELD: plasma technology.
SUBSTANCE: device belongs to the field of plasma technology and can be used in the development of electron-beam devices, as well as used in electron-beam technology, experimental physics, plasma-chemical technology. The accelerating gap of a pulsed forevacuum electron source based on an arc discharge includes a flat anode and an accelerating electrode, which are separated by a high-voltage insulator. The flat anode consists of a mesh stretched with rings that are attached to the base of the anode. In the area of contact of the anode rings with the protrusion of the high-voltage insulator, a depression of 1 mm and a length of 13 mm is made.
EFFECT: reduction of heat transfer from the flat anode to the high voltage insulator.
1 cl, 1 tbl, 1 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| PLASMA EMITTER OF A PULSE FOREVACUUM ELECTRON SOURCE BASED ON AN ARC DISCHARGE | 2020 |
|
RU2759425C1 |
| PLASMA SOURCE OF ELECTRONS WITH SYSTEM FOR AUTOMATIC IGNITION OF GLOW DISCHARGE IN HOLLOW CATHODE, OPERATING IN MEDIUM VACUUM | 2023 |
|
RU2816693C1 |
| PLASMA ELECTRON SOURCE | 2005 |
|
RU2306683C1 |
| METHOD FOR ELECTRON BEAM GENERATION FOR ELECTRON SOURCES WITH PLASMA EMITTERS AND ANODE PLASMA | 2021 |
|
RU2780805C1 |
| VOLUMETRIC GAS-DISCHARGE PLASMA GENERATOR | 2000 |
|
RU2175469C1 |
| PLASMA ELECTRON SOURCE | 2002 |
|
RU2215383C1 |
| METHOD OF OBTAINING ELECTRON BEAM AND DEVICE TO THIS END (VERSONS) | 2007 |
|
RU2341846C1 |
| GAS-DISCHARGE SPUTTERING APPARATUS BASED ON PLANAR MAGNETRON WITH ION SOURCE | 2020 |
|
RU2752334C1 |
| PULSED ELECTRON BEAM SOURCE (VERSIONS) | 2009 |
|
RU2395866C1 |
| PENNING-DISCHARGE PLASMA ELECTRON SOURCE USING RADIALLY CONVERGING RIBBON BEAMS | 2003 |
|
RU2256979C1 |
