PLASMA ELECTRON SOURCE OF RIBBON BEAM Russian patent published in 2004 - IPC

Abstract RU 2231164 C1

FIELD: plasma technology, development of cathode-ray devices, cathode-ray technology, experimental physics, plasma-chemical technology.

SUBSTANCE: plasma electron source designed to generate uninterrupted electron beam of ribbon configuration includes cylindrical hollow cathode with window in sidewall, anode with emission window overlapped by metal grid, accelerating electrode with window for passage of electron beam. Plates made of heat-resistant inorganic dielectric close internal face walls of hollow cathode.

EFFECT: enhanced uniformation content of electron beam over its cross-section thanks to diminished edges maxim of current density in beam on its edges.

2 dwg

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RU 2 231 164 C1

Authors

Burdovitsin V.A.

Fedorov M.V.

Oks E.M.

Dates

2004-06-20Published

2003-03-24Filed