PLASMA ELECTRON SOURCE Russian patent published in 2007 - IPC H05H1/00 

Abstract RU 2306683 C1

FIELD: plasma engineering, possible use for designing cathode-ray devices and in cathode-ray technology, experimental physics, plasma-chemical technology.

SUBSTANCE: in known source, containing coaxial hollow cathode, anode, accelerating electrode, disk made of thermo-resistant inorganic dielectric, emission aperture is made in the center of anode and left open, and around the emission aperture in anode windows are made, covered by a mesh with cell size lesser than radius of emission aperture.

EFFECT: ensured initiation of discharge and preserved primary emission from single emission aperture.

1 cl, 3 dwg

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RU 2 306 683 C1

Authors

Burdovitsin Viktor Alekseevich

Zhirkov Igor' Sergeevich

Oks Efim Mikhajlovich

Osipov Igor' Vladimirovich

Dates

2007-09-20Published

2005-12-21Filed