FIELD: agriculture, in particular, plant growing. SUBSTANCE: method involves exposing seed material to negative ion flow in electrode gap; placing seed material in uniform layer on metallic sheet; providing galvanic grounding of metallic sheet through ampere meter; treating seed material with uniform negative ion flow created in 50-60 cm air gap, above seed material layer; determining negative ion flow dose from formula: where I is ionization current, A; S is metallic sheet area, sq.m; T is ionization time, s. Oxygen flow may be supplied simultaneously with negative ion flow. EFFECT: reduced germination time and increased crop yield owing to improved seed material treatment quality. 2 cl, 1 dwg
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Authors
Dates
2003-12-20—Published
2002-05-08—Filed