PLASMA SOURCE AND ITS OPERATING PROCESS Russian patent published in 2003 - IPC

FIELD: space engineering; taking off electrostatic potential of space vehicles and plasma contactor in electrodynamic cable systems. SUBSTANCE: plasma source has at least two hollow cathodes each incorporating emitter, starting heater, set of fire walls, and igniter rod, as well as filament power supplies connected to starter heaters and ignition discharge sources connected to emitters and igniter electrodes. Hollow cathodes are spaced maximum 0.2 m apart and their emitters are electrically interconnected. Operating process of plasma source incorporating at least two hollow cathodes includes plasma-forming gas supply to one of cathodes, start-up heating of the latter, ignition of discharge between emitter and igniter electrode followed by heater turn-off. Upon ignition of discharge in first cathode plasma-forming gas is fed to other cathode and ignition discharge is set up therein. As an alternative, operating algorithm of plasma source can be simplified by supplying plasma-forming gas to both cathodes at a time and upon start-up heating of one of cathodes power supplies of ignition discharges of both cathodes are turned on simultaneously. In addition after ignition discharges are set up in both cathodes that in first cathode can be turned off. EFFECT: enhanced ion current injected by plasma source. 4 cl, 2 dwg