HIGH-PURITY TANTALUM AND ARTICLES CONTAINING SUCH TANTALUM SIMILAR TO SPRAYING TARGETS Russian patent published in 2004 - IPC

Abstract RU 2233899 C2

FIELD: production of high-purity tantalum and its alloys.

SUBSTANCE: metallic tantalum has purity of 99.995% and higher, preferably 99.999%.Size of grain of proposed tantalum is about 50 mcm and lesser; its texture has (100) pole figure at intensity of central peak below than 15 random or logarithm of ratio of intensities (111) : (100) of central peak is more than about minus 4.0 or any combination of these properties. Articles made from such tantalum include spraying targets, collector capacitances, resistive film layers and wire. Production of tantalum includes stage of interaction of salt containing tantalum with at least one compound which may reduce this salt to tantalum powder and second salt in reaction reservoir. Reaction vessel or lining of this vessel and stirrer or its lining are made from metal possessing the same or higher pressure of vapor.

EFFECT: possibility of obtaining high-purity tantalum at fine and homogeneous microstructure.

202 cl, 11 dwg, 15 tbl

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RU 2 233 899 C2

Authors

Mikhaljuk Kristofer A.

Magvajr Dzhejms D. Ml.

Kochak Mark N.

Kh'Juber Luis E. Ml.

Dates

2004-08-10Published

1999-11-24Filed