FIELD: metallurgy.
SUBSTANCE: manufacturing method of cast target for magnetron sputtering from tantalum-based alloy and target obtained using the above method is proposed. Method involves obtaining of an ingot of alloy on the basis of tantalum. First, tantalum ingot of high purity degree is obtained by means of deep vacuum refining by electron-beam drip re-melting of a workpiece made by pressing of high-purity tantalum powders; besides, ingots of intermetallic compounds TaFe2 and YFe3 are obtained by melting of tantalum with iron and yttrium with iron; after that, arc vacuum remelting of high-purity tantalum ingot with ingots of intermetallic compounds TaFe2 and YFe3 is performed at their ratio, wt %: TaFe2 3.0-10.0, YFe3 0.3-3.0, Ta - the rest; ingot of tantalum-based alloy with composition of Ta + 1 wt % Fe + 0.1 wt % Y is obtained and subject to machining.
EFFECT: improving the quality of sputtered targets in order to increase the yield ratio of thin-film capacitors.
2 cl, 1 tbl, 1 ex
